The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

Jun. 24, 2019
Applicant:

Excillum Ab, Kista, SE;

Inventors:

Per Takman, Kista, SE;

Ulf Lundström, Kista, SE;

Björn Hansson, Kista, SE;

Assignee:

EXCILLUM AB, Kista, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/14 (2006.01); H01J 35/08 (2006.01); H05G 1/52 (2006.01); H05G 1/26 (2006.01);
U.S. Cl.
CPC ...
H01J 35/147 (2019.05); H01J 35/112 (2019.05); H01J 35/14 (2013.01); H01J 2235/082 (2013.01); H05G 1/26 (2013.01); H05G 1/52 (2013.01);
Abstract

A method in an X-ray source configured to emit, from an interaction region, X-ray radiation generated by an interaction between an electron beam and a target, the method including the steps of: providing the target; providing the electron beam; deflecting the electron beam along a first direction relative the target; detecting electrons indicative of the interaction between the electron beam and the target; determining a first extension of the electron beam on the target, along the first direction, based on the detected electrons and the deflection of the electron beam; detecting X-ray radiation generated by the interaction between the electron beam and the target; and determining a second extension of the electron beam on the target, along a second direction, based on the detected X-ray radiation.


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