The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
Sep. 29, 2017
Applicant:
Intevac, Inc., Santa Clara, CA (US);
Inventors:
Terry Bluck, Santa Clara, CA (US);
Babak Adibi, Los Altos, CA (US);
Assignee:
INTEVAC, INC., Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); C23C 14/56 (2006.01); C23C 14/08 (2006.01); C23C 14/06 (2006.01); C03C 17/36 (2006.01); C03C 17/245 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C03C 17/245 (2013.01); C03C 17/36 (2013.01); C03C 17/366 (2013.01); C03C 17/3626 (2013.01); C03C 17/3644 (2013.01); C23C 14/0652 (2013.01); C23C 14/083 (2013.01); C23C 14/568 (2013.01);
Abstract
The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.