The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

May. 13, 2020
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Janette Dawn Hevner, Addison, NY (US);

Yuhui Jin, Painted Post, NY (US);

Aize Li, Painted Post, NY (US);

John Robert Saltzer, Jr., Beaver Dams, NY (US);

Assignee:

CORNING INCORPORATED, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C03C 19/00 (2006.01); C04B 41/53 (2006.01);
U.S. Cl.
CPC ...
C03C 15/00 (2013.01); C03C 19/00 (2013.01); C04B 41/5353 (2013.01); C03C 2203/52 (2013.01);
Abstract

A method of modifying a substrate comprising an etching step comprising contacting one or more primary surfaces of a glass, glass-ceramic, or ceramic substrate with a solution for a time period of 20 minutes to 8 hours to generate one or more etched primary surfaces, the solution comprising over 10 percent by weight of one or more alkali hydroxides, the solution having a temperature within the range of 100° C. to 150° C., the substrate having a thickness between the primary surfaces that decreases during the time period by 5 μm to 100 μm at a rate of 2 μm per hour or greater. The solution of the etching step does not comprise hydrogen fluoride. The one or more alkali hydroxides of the solution of the etching step can be sodium hydroxide (NaOH), potassium hydroxide (KOH), or a combination of both sodium hydroxide and potassium hydroxide.


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