The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2022
Filed:
Apr. 12, 2018
Massachusetts Institute of Technology, Cambridge, MA (US);
Peng Bai, Cambridge, MA (US);
Martin Z. Bazant, Wellesley, MA (US);
Fikile R. Brushett, Cambridge, MA (US);
Jihyung Han, Jeju-do, KR;
Miao Wang, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Surface conduction in porous media can drastically alter the stability and morphology of electrodeposition at high rates, above the diffusion-limited current. Above the limiting current, surface conduction inhibits growth in the positive membrane and produces irregular dendrites, while it enhances growth and suppresses dendrites behind a deionization shock in the negative membrane. The discovery of uniform growth contradicts quasi-steady 'leaky membrane' models, which are in the same universality class as unstable Laplacian growth, and indicates the importance of transient electro-diffusion or electro-osmotic dispersion. Shock electrodeposition could be exploited for high-rate recharging of metal batteries or manufacturing of metal matrix composite coatings.