The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Jan. 26, 2018
Applicant:

Mitsui Chemicals Tohcello, Inc., Tokyo, JP;

Inventors:

Eiji Hayashishita, Nagoya, JP;

Hirokazu Takahashi, Tokyo, JP;

Kazuhide Fukura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 21/683 (2006.01); C09J 7/25 (2018.01); C09J 7/30 (2018.01); B32B 7/12 (2006.01); B32B 15/09 (2006.01); B32B 15/18 (2006.01); B32B 27/08 (2006.01); B32B 27/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6836 (2013.01); B32B 7/12 (2013.01); B32B 15/09 (2013.01); B32B 15/18 (2013.01); B32B 27/08 (2013.01); B32B 27/36 (2013.01); C09J 7/255 (2018.01); C09J 7/30 (2018.01); B32B 2457/00 (2013.01); C09J 2433/00 (2013.01); C09J 2467/006 (2013.01); H01L 2221/68336 (2013.01);
Abstract

Provided is a component-manufacturing film that includes a first region Sand a second region Sdisposed so as to surround the region S; the region Sis formed of a base layer and an adhesive layer provided on one surface side of the base layer; the region Sis formed of the base layer, the adhesive layer, and an additional layer affixed onto the layer. In the temperature range of 190° C. or lower, a tensile elastic modulus of the additional layer is equal to or greater than the tensile elastic modulus of the base layer. Further provided are a component-manufacturing tool and method, the latter including a component fixing step; a film placement step of performing placement so that the boundary between the region Sand the region Sis located inside with respect to an edge of the chuck table; a chucking step; and a heating step.


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