The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Oct. 31, 2019
Applicants:

Ksm Component Co., Ltd., Gimpo-si, KR;

Flowserve Ksm Co., Ltd., Gimpo-si, KR;

Inventors:

Yun Ho Kim, Seoul, KR;

Joo Hwan Kim, Seoul, KR;

Ki Ryong Lee, Gimpo-si, KR;

Assignees:

KSM COMPONENT CO., LTD., Gimpo-si, KR;

FLOWSERVE KSM CO., LTD., Gimpo-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C04B 35/111 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); C04B 35/645 (2006.01); C04B 35/117 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); C04B 35/111 (2013.01); C04B 35/117 (2013.01); C04B 35/645 (2013.01); H01L 21/68757 (2013.01); C04B 2235/3224 (2013.01); Y10T 279/23 (2015.01);
Abstract

Disclosed are: an electrostatic chuck having a high volume resistivity so as to reduce a leakage current, thereby improving the adsorption and desorption response characteristics of a semiconductor wafer; and a manufacturing method therefor. The electrostatic chuck is a sintered body in which an electrode is impregnated so as to fix a semiconductor wafer by electrostatic force, and comprises alumina, a sintering aid, and a rare earth composite oxide comprising two to five different rare earth metals, has adsorption and desorption response characteristics of a semiconductor wafer of two seconds or less, and has a volume resistivity at room temperature of 1.0E+16 Ω·cm to 1.0E+17 Ω·cm.


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