The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2022
Filed:
Feb. 12, 2020
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Hyeon Park, Suwon-si, KR;
Yoojeong Choi, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Shinhyo Bae, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); C08G 73/06 (2006.01); C08G 18/79 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 18/791 (2013.01); C08G 73/0655 (2013.01); G03F 7/0045 (2013.01); G03F 7/168 (2013.01);
Abstract
A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent and a method of forming patterns using the resist underlayer composition: In Chemical Formula 1, at least one of Aand Ais a group represented by Chemical Formula A: