The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Feb. 25, 2020
Applicant:

Facebook Technologies, Llc, Menlo Park, CA (US);

Inventors:

Matthew E. Colburn, Woodinville, WA (US);

Giuseppe Calafiore, Redmond, WA (US);

Matthieu Charles Raoul Leibovici, Seattle, WA (US);

Erik Shipton, Kirkland, WA (US);

Pasi Saarikko, Kirkland, WA (US);

Assignee:

Facebook Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 8/00 (2006.01); G02B 27/01 (2006.01); G02B 5/18 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0065 (2013.01); G02B 5/1809 (2013.01); G02B 5/1857 (2013.01); G02B 6/0016 (2013.01); G02B 6/0038 (2013.01); G02B 27/0172 (2013.01); G03F 7/001 (2013.01); G03F 7/0005 (2013.01); G03F 7/0035 (2013.01); G03F 7/16 (2013.01); G03F 7/40 (2013.01); G03F 7/70991 (2013.01); G02B 2027/0125 (2013.01);
Abstract

A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning of one or more photoresists to create a stack over a substrate. The manufacturing system performs a conformal deposition of a protective coating on the stack. The manufacturing system performs a deposition of a first photoresist of a first refractive index on the protective coating. The manufacturing system performs a removal of the first photoresist to achieve a threshold value of first thickness. The manufacturing system performs a deposition of a second photoresist of a second refractive index on the first photoresist. The second refractive index is greater than the first refractive index. The manufacturing system performs a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating.


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