The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Dec. 10, 2018
Applicant:

Center for Advanced Meta-materials, Daejeon, KR;

Inventors:

Se Jeong Won, Daejeon, KR;

Hyun June Jung, Daejeon, KR;

Jae Hyun Kim, Daejeon, KR;

Kwang Seop Kim, Daejeon, KR;

Hak Joo Lee, Daejeon, KR;

Bong Kyun Jang, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/194 (2017.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/34 (2006.01); B82Y 15/00 (2011.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C01B 32/194 (2017.08); G03F 7/094 (2013.01); G03F 7/2059 (2013.01); G03F 7/34 (2013.01); B82Y 15/00 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 2204/06 (2013.01); C01P 2004/17 (2013.01);
Abstract

A nanomaterial ribbon patterning method includes: forming a first nanomaterial layer having a first threshold strain on an upper surface of a substrate; forming a second nanomaterial layer on an upper surface of the first nanomaterial layer; forming a thin layer having a second threshold strain smaller than the first threshold strain on an upper surface of the second nanomaterial layer; generating plural cracks on the thin layer and the second nanomaterial layer by applying tensile force to the substrate; placing a mask on an upper surface of the thin layer; removing the mask and peeling off the sacrificial layer on the upper surface of the thin layer; and removing the sacrificial layer to form a nanomaterial ribbon pattern.


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