The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Jul. 28, 2017
Applicant:

Nanyang Technological University, Singapore, SG;

Inventors:

Lan Zhang, Singapore, SG;

Siew Hwa Chan, Singapore, SG;

Ovi Lian Ding, Singapore, SG;

Hongquan He, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 20/10 (2006.01); B01J 20/12 (2006.01); B01D 53/02 (2006.01); B01D 53/68 (2006.01); B01D 53/82 (2006.01); B01J 20/20 (2006.01); B01J 20/30 (2006.01); B01J 20/32 (2006.01); B01J 20/28 (2006.01); B01J 20/06 (2006.01); C01B 3/50 (2006.01); B01J 20/02 (2006.01); B01D 53/40 (2006.01); B01D 53/42 (2006.01);
U.S. Cl.
CPC ...
B01J 20/103 (2013.01); B01D 53/02 (2013.01); B01D 53/685 (2013.01); B01D 53/82 (2013.01); B01J 20/0244 (2013.01); B01J 20/06 (2013.01); B01J 20/12 (2013.01); B01J 20/20 (2013.01); B01J 20/28026 (2013.01); B01J 20/3085 (2013.01); B01J 20/3204 (2013.01); B01J 20/327 (2013.01); B01J 20/3248 (2013.01); C01B 3/508 (2013.01); B01D 53/40 (2013.01); B01D 53/42 (2013.01); B01D 2253/102 (2013.01); B01D 2253/106 (2013.01); B01D 2253/108 (2013.01); B01D 2253/11 (2013.01); B01D 2253/1124 (2013.01); B01D 2253/202 (2013.01); B01D 2253/25 (2013.01); B01D 2253/308 (2013.01); B01D 2256/16 (2013.01); B01D 2257/2025 (2013.01); B01J 20/28016 (2013.01); C01B 2203/0465 (2013.01); C01B 2203/0495 (2013.01); C01B 2203/066 (2013.01);
Abstract

The invention provides a composite material formed from an inorganic mesoporous, or mesoporous-like, material that is dispersed throughout a polymeric matrix formed by a crosslinked polymer that has acidic- or basic-residues and which may also optionally have further acidic- or basic-residues grafted onto the inorganic mesoporous material. The resulting composite material may be used to remove acidic or basic impurities from a gas in need thereof and can be easily regenerated.


Find Patent Forward Citations

Zhang, Lan. (2022). Composite material, its manufacture and use in gas purification (U.S. Patent No. 11247190). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11247190

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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