The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

Jul. 03, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Martin M. Frank, Dobbs Ferry, NY (US);

Takashi Ando, Tuckahoe, NY (US);

Xiao Sun, Pleasantville, NY (US);

Jin Ping Han, Yorktown Heights, NY (US);

Vijay Narayanan, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 49/02 (2006.01); H01L 27/11507 (2017.01); H01L 21/3213 (2006.01); H01L 21/02 (2006.01); H01L 21/283 (2006.01); H01B 3/10 (2006.01);
U.S. Cl.
CPC ...
H01L 28/40 (2013.01); H01B 3/10 (2013.01); H01L 21/02181 (2013.01); H01L 21/02356 (2013.01); H01L 21/283 (2013.01); H01L 21/32133 (2013.01); H01L 27/11507 (2013.01); H01L 28/55 (2013.01); H01L 28/60 (2013.01);
Abstract

Artificial synaptic devices with an HfO-based ferroelectric layer that can be implemented in the CMOS back-end are provided. In one aspect, an artificial synapse element is provided. The artificial synapse element includes: a bottom electrode; a ferroelectric layer disposed on the bottom electrode, wherein the ferroelectric layer includes an HfO-based material that crystallizes in a ferroelectric phase at a temperature of less than or equal to about 400° C.; and a top electrode disposed on the bottom electrode. An artificial synaptic device including the present artificial synapse element and methods for formation thereof are also provided.


Find Patent Forward Citations

Loading…