The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

Nov. 18, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jim Shih-Chun Liang, Poughkeepsie, NY (US);

Baozhen Li, South Burlington, VT (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 49/02 (2006.01); H01L 27/01 (2006.01);
U.S. Cl.
CPC ...
H01L 21/707 (2013.01); H01L 27/016 (2013.01); H01L 28/20 (2013.01); H01L 28/60 (2013.01);
Abstract

An IC device includes a simultaneously formed capacitor and resistor structure. The capacitor and resistor may be located between a Back End of the Line (BEOL) interconnect stack and an external device interconnect pad of the IC device. The resistor may be used to step down a voltage applied across the resistor. The resistor may include one or more resistor plates that are formed simultaneously with a respective one or more plates of the capacitor. For example, a capacitor plate and a resistor plate may be patterned and formed from the same conductive sheet. Each of the resistor plates may be connected to one or more vertical interconnect accesses (VIA).


Find Patent Forward Citations

Liang, Jim Shih-Chun. (2022). On integrated circuit (ic) device simultaneously formed capacitor and resistor (U.S. Patent No. 11244850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11244850

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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