The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

Mar. 24, 2021
Applicant:

Canon Anelva Corporation, Kanagawa, JP;

Inventors:

Kazuya Tsujino, Kanagawa, JP;

Yoichi Ando, Kanagawa, JP;

Assignee:

CANON ANELVA CORPORATION, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/00 (2006.01); H01J 35/14 (2006.01); H01J 35/08 (2006.01); G01N 23/04 (2018.01);
U.S. Cl.
CPC ...
H01J 35/147 (2019.05); G01N 23/04 (2013.01); H01J 35/116 (2019.05); H01J 35/153 (2019.05); G01N 2223/204 (2013.01);
Abstract

An X-ray generation device includes a cathode including an electron source generating an electron beam, an anode including a target to transmit an X-ray generated by collision of the electron beam, and a convergence electrode converging the electron beam toward the target. The target has a first region having a locally small thickness and a second region having a larger thickness than the first region. The X-ray generation device further includes a deflection unit to switch an incident position of the electron beam between the first region and the second region. The deflection unit has an adjustment mode to adjust an X-ray focal spot diameter and an X-ray generation mode to generate an X-ray, the electron beam is caused to enter the first region in the adjustment mode, and the electron beam is caused to enter the second region in the X-ray generation mode.


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