The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Mar. 17, 2020
Revenue Management Solutions, Llc, Oklahoma City, OK (US);
Jay Wagner, Yukon, OK (US);
Revenue Management Solutions, LLC, Oklahoma City, OK (US);
Abstract
Images in bitonal formats often include watermarks, stamps, or other patterns and artifacts. These patterned artifacts may be represented as a series of geometric points, dots, and/or dashes in the general shape of the original pattern. These patterned artifacts make other processes such as optical character recognition (OCR) difficult or impossible when items or pixels of interest are also found within the pattern of such artifact(s). Current patterned artifact removal solutions use methods of erosion to minimize the unwanted patterned artifact. However, such methods also erode the pixels/items of interest which, in turn, cause failures in other processes, such as OCR, that are desired to be carried out on or with the image.