The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Nov. 20, 2020
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Chin Lien, Hsinchu, TW;
Cho-Fan Hsieh, Hsinchu, TW;
Chia-Jen Lin, Hsinchu, TW;
Yu-Tai Li, Hsinchu, TW;
Wei-You Lin, Hsinchu, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/3504 (2014.01); G01N 21/3581 (2014.01);
U.S. Cl.
CPC ...
G01N 21/3504 (2013.01); G01N 21/3581 (2013.01);
Abstract
A gas measurement device is provided and includes a gas channel module and a sensor component disposed within the gas channel module. The sensor component includes a substrate, a porous membrane, and a metal layer disposed between the substrate and the porous membrane. A gas measurement method is also provided.
Lien, Chin. (2022). Gas measurement device and gas measurement method (U.S. Patent No. 11243161). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11243161
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile