The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2022

Filed:

Jul. 22, 2019
Applicant:

Joled Inc., Tokyo, JP;

Inventors:

Yasuhiro Terai, Tokyo, JP;

Naoki Asano, Tokyo, JP;

Takashi Maruyama, Tokyo, JP;

Assignee:

JOLED INC., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/45 (2006.01); H01L 21/027 (2006.01); H01L 21/465 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01); H01L 29/4175 (2013.01); H01L 29/41733 (2013.01); H01L 29/66969 (2013.01); H01L 29/78696 (2013.01); H01L 21/0274 (2013.01); H01L 21/02164 (2013.01); H01L 21/02271 (2013.01); H01L 21/465 (2013.01); H01L 29/45 (2013.01);
Abstract

A semiconductor device includes a semiconductor film, an interlayer insulating film, a source-drain electrode, and a semiconductor auxiliary film. The semiconductor film includes an oxide semiconductor material and has a channel region and a low-resistance region. The low-resistance region has an electric resistance lower than an electric resistance of the channel region. The interlayer insulating film covers the semiconductor film and has a through-hole opposed to the low-resistance region. The source-drain electrode includes a source electrode and a drain electrode and is electrically coupled to the semiconductor film through the through-hole. The semiconductor auxiliary film is in contact with the low-resistance region of the semiconductor film, reduces an electric resistance of the semiconductor film, and has a first opening at least on a part of a portion opposed to the through-hole.


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