The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Jan. 27, 2020
Idemia Identity & Security Usa Llc, Billerica, MA (US);
Peter Zhen-Ping Lo, Mission Viejo, CA (US);
Hui Chen, Foothill Ranch, CA (US);
IDEMIA IDENTITY & SECURITY USA LLC, Billerica, MA (US);
Abstract
A list of possible mated minutiae in a reference fingerprint and a search fingerprint is identified. The list of possible mated minutiae is divided into different groups of mated minutiae using pose grouping based on rigid transformation parameters. For each group, the possible mated minutiae are filtered to get a set of consistent mated minutiae pairs having similar rigid transformation. The topological consistency between groups is determined. If any two groups are topologically consistent to each other, they are merged to form a (virtual) larger group. A non-linear transformation parameters are estimated from the mated minutiae in the merged group. The overall similarity of mated and non-mated minutiae in the overlapping area is determined after non-linear alignment of the two fingerprints, and the maximum similarity is output as the final similarity score between two fingerprints.