The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Mar. 08, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Atsushi Kusaka, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus including a first detection unit configured to detect a surface structure in a wafer edge region of the substrate, a specifying unit configured to specify, from the surface structure detected by the first detection unit, an effective region in which the pattern of the imprint material is formed, and a first determining unit configured to determine, based on the effective region specified by the specifying unit, a shape of a peripheral shot region whose area is smaller than an area of a pattern region of the mold, and a second determining unit configured to determine based on the shape determined by the first determining unit, a supply position of the imprint material in the peripheral shot region.