The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2022

Filed:

Feb. 18, 2019
Applicant:

The University of Tokyo, Tokyo, JP;

Inventors:

Shik Shin, Tokyo, JP;

Toshiyuki Taniuchi, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/227 (2018.01); H01J 37/05 (2006.01); H01J 37/10 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
G01N 23/227 (2013.01); H01J 37/05 (2013.01); H01J 37/10 (2013.01); H01J 37/226 (2013.01); H01J 37/244 (2013.01); H01J 37/26 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24585 (2013.01);
Abstract

An electron microscope includes: a laser light source configured to generate a CW laser; an irradiation lens system configured to irradiate a measurement sample with the CW laser; an energy analyzer configured to disperse, depending on energy, photoelectrons emitted from the measurement sample by irradiation with the CW laser; an energy slit configured to allow a photoelectron with a specified energy to pass, among the photoelectrons; an electron beam detector configured to detect the photoelectron passed through the energy slit; a first electron lens system configured to focus the photoelectrons emitted from the measurement sample onto the energy analyzer; and a second electron lens system configured to project the photoelectron passed through the energy slit onto the electron beam detector.


Find Patent Forward Citations

Loading…