The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Jun. 07, 2017
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventors:
Yasushi Morii, Ibaraki, JP;
Yoshimasa Koido, Ibaraki, JP;
Assignee:
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 21/00 (2006.01); C22F 1/04 (2006.01); C22C 28/00 (2006.01); C22F 1/16 (2006.01); C22F 1/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 21/00 (2013.01); C22C 28/00 (2013.01); C22F 1/04 (2013.01); C22F 1/16 (2013.01); C23C 14/34 (2013.01); C22F 1/00 (2013.01);
Abstract
A sputtering target according to this invention comprises an alloy of Al and Sc and contains from 25 at. % to 50 at. % of Sc. The sputtering target has an oxygen content of 2000 ppm by mass or less, and a variation in Vickers hardness (Hv) of 20% or less.