The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Nov. 01, 2017
Institute for Basic Science, Daejeon, KR;
Postech Academy-industry Foundation, Pohang-si, KR;
Won Jong Kim, Pohang-si, KR;
Jeong Hun Kim, Seoul, KR;
Jihyun Lee, Pohang-si, KR;
Byung Joo Lee, Seoul, KR;
INSTITUTE FOR BASIC SCIENCE, Daejeon, KR;
POSTECH ACADEMY-INDUSTRY FOUNDATION, Pohang-si, KR;
Abstract
The present invention relates to a method for producing dextran polymer-based amplified nucleic acid aptamer nanoconstructs which efficiently and selectively capture a specific target molecule, the method comprising linking a short nucleic acid sequence or a complementary sequence for formation of nanoconstructs and a nucleic acid aptamer sequence for capture of the specific target molecule to a dextran polymer by a chemical reaction, mixing the resulting polymer/nucleic acid substances with each other to form nanostructures, subjecting the nanostructures to rolling circle amplification, thereby forming a nucleic acid aptamer having a repeated structure. The dextran polymer-based amplified nucleic acid aptamer nanoconstructs have the effect of efficiently and selectively capturing a specific target molecule.