The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2022

Filed:

Oct. 02, 2018
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventors:

Kosuke Uchida, Osaka, JP;

Toru Hiyoshi, Osaka, JP;

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); H01L 29/4236 (2013.01); H01L 29/7813 (2013.01);
Abstract

A silicon carbide substrate has a first main surface and a second main surface opposite to the first main surface. A gate pad faces the first main surface. A drain electrode is in contact with the second main surface. The silicon carbide substrate includes a first impurity region constituting the second main surface and having a first conductivity type, a second impurity region provided on the first impurity region and having a second conductivity type different from the first conductivity type, a third impurity region provided on the second impurity region and having the first conductivity type, and a fourth impurity region provided on the third impurity region, constituting the first main surface, and having the second conductivity type. Each of the first impurity region, the second impurity region, the third impurity region, and the fourth impurity region is located between the gate pad and the drain electrode.


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