The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2022
Filed:
Nov. 20, 2018
Dh Technologies Development Pte. Ltd., Singapore, SG;
Don W Arnold, Livermore, CA (US);
Thomas R. Covey, Richmond Hill, CA;
Chang Liu, Richmond Hill, CA;
Bogdan Morosan, Toronto, CA;
DH Technologies Development Pte. Ltd., Singapore, SG;
Abstract
Mass spectrometer based analytical systems and methods in which a feedback control system can be utilized to control the flow of liquid within a sampling probe to adjust and/or maintain the surface profile (e.g., shape) of the liquid-air interface within an open sampling port of the sampling probe. The feedback control systems can automatically monitor and/or detect the surface profile of the liquid-air interface and adjust the flow rate of the sampling liquid to ensure that experimental conditions remain consistent at the time of sample introduction during serial samplings. These can provide stable and reproducible analyte flows of consistent dilution to the ion source, increasing reproducibility and/or accuracy of data generated by MS analysis. Can be used with a change in the desired set point according to the particular experimental workflow (e.g., automated adjustment between an interface corresponding to a sampling set point and a cleaning set point).