The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2022

Filed:

Feb. 10, 2020
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Ki Ju Im, Suwon-si, KR;

Tae Young Kim, Seongnam-si, KR;

Hyo Jung Kim, Goyang-si, KR;

Jong Woo Park, Seongnam-si, KR;

Young Tae Choi, Cheonan-si, KR;

Hyun Cheol Hwang, Seoul, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G 3/3266 (2016.01); G09G 3/3233 (2016.01); H01L 27/32 (2006.01); H01L 29/786 (2006.01); H01L 29/06 (2006.01); G09G 3/3275 (2016.01);
U.S. Cl.
CPC ...
G09G 3/3266 (2013.01); G09G 3/3233 (2013.01); G09G 3/3275 (2013.01); H01L 27/3258 (2013.01); H01L 27/3262 (2013.01); H01L 27/3276 (2013.01); H01L 29/0684 (2013.01); H01L 29/78696 (2013.01);
Abstract

A display device includes: a substrate; a gate pattern disposed on the substrate; an oxide semiconductor layer disposed on the substrate, the oxide semiconductor layer includes a channel region that overlaps with the gate pattern; and an insulating film disposed on the gate pattern, the insulating film includes majority carrier supporting ions, wherein the gate pattern includes a plurality of gate holes, wherein the gate holes are formed inside a region of the gate pattern that does not overlap with the channel region of the oxide semiconductor layer, and wherein the channel region of the oxide semiconductor layer includes the majority carrier supporting ions.


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