The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2022

Filed:

Dec. 07, 2017
Applicant:

Universität Stuttgart, Stuttgart, DE;

Inventors:

Klaus Körner, Berlin, DE;

Wolfgang Osten, Stuttgart, DE;

Assignee:

Universität Stuttgart, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); A61B 5/00 (2006.01); G01B 9/04 (2006.01);
U.S. Cl.
CPC ...
G01B 9/0203 (2013.01); A61B 5/0066 (2013.01); G01B 9/02032 (2013.01); G01B 9/02049 (2013.01); G01B 9/02091 (2013.01); G01B 9/04 (2013.01); G01B 2290/60 (2013.01);
Abstract

The present invention relates to an arrangement and a method for single-shot interferometry which can be used for detecting distance, profile, shape, undulation, roughness or the optical path length in or on optically rough or smooth objects or else for optical coherence tomography (OCT). The arrangement comprises a light source, an interferometer, in which an end reflector is arranged in the reference beam path, and also a detector for detecting an interferogram. In the reference beam path of the interferometer, the end reflector can be embodied with three plane reflecting surfaces as a prism mirror or air mirror assembly in order to generate between reference and object beams a lateral shear of magnitude delta_q for obtaining a spatial interferogram. The embodiment of said assembly with regard to the angles and the arrangement of the reflecting surfaces makes possible a large aperture angle for a high numerical aperture. In the method, in the reference beam path it is possible to carry out a reduction of the aperture angle of the reference beam using beam-limiting means in order to achieve an optimum adaptation to the geometrically given aperture angle of the end reflector in the reference beam path, which is designed to be smaller than the aperture angle in the object beam path. The end reflector in the reference beam path can also be used as part of a second interferometer for high-resolution measurement of the displacement of the arrangement for single-shot interferometry, wherein said displacement serves for focusing. The end reflector is embodied as a triple reflection arrangement (e.g. a prism arrangement) having three reflecting surfaces. The triple reflection arrangement can have an M- or W-beam path, a non-intersecting zigzag beam path or an intersecting (zigzag) beam path.


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