The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2022
Filed:
Mar. 29, 2018
Asm Ip Holding B.v., Almere, NL;
Dieter Pierreux, Dilbeek, BE;
Cornelis Thaddeus Herbschleb, Leiden, NL;
Werner Knaepen, Leuven, BE;
Bert Jongbloed, Oud-Heverlee, BE;
Steven Van Aerde, Tielt-Winge, BE;
Kelly Houben, Lubbeek, BE;
Theodorus Oosterlaken, Oudewater, NL;
Chris de Ridder, Almere, NL;
Lucian Jdira, Nieuw Vennep, NL;
ASM IP Holding B.V., Almere, NL;
Abstract
The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.