The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2022
Filed:
Apr. 13, 2018
Case Western Reserve University, Cleveland, OH (US);
Christopher J. Miller, Cleveland, OH (US);
Souvik Ghosh, Cleveland, OH (US);
Yongkun Sui, Cleveland, OH (US);
R. Mohan Sankaran, University Heights, OH (US);
Christian A. Zorman, Euclid, OH (US);
Case Western Reserve University, Cleveland, OH (US);
THE UNITED STATES GOVERNMENT AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF VETERANS AFFAIRS, Washington, DC (US);
Abstract
A method for directly writing metal traces on a wide range of substrate materials is disclosed. The method includes writing a pattern of particle-free metal-salt-based ink on the substrate followed by a plasma-based treatment to remove the non-metallic components of the ink and decompose its metal salt into pure metal. The ink is based on a multi-part solvent whose components differ in at least one of evaporation rate, surface tension, and viscosity, which improves the manner in which the ink is converted into its metal constituent via the plasma treatment. In some embodiments, a microplasma is used for post-treatment of the deposited ink, where the plasma properties are controlled to provide different material properties, such as porosity and effective resistivity, in different regions of the metal pattern.