The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Apr. 18, 2019
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
SeungBoo Jung, Seoul, KR;
KwangHo Jung, Suwon-si, KR;
WooRam Myung, Suwon-si, KR;
HakSan Jeong, Seoul, KR;
BumGeun Park, Suwon-si, KR;
ChoongJae Lee, Suwon-si, KR;
KyungDeuk Min, Suwon-si, KR;
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
Abstract
The present invention relates to a method for formation of a redistribution layer using photo-sintering and to the redistribution layer formed by the method. The method for forming a redistribution layer using photo-sintering includes printing, on a substrate, a liquid electrode pattern for a redistribution layer; coating a transparent polymer on the substrate and the pattern; photo-sintering the electrode pattern using photonic energy; and evaporating an organic substance contained in the liquid electrode pattern via the photo-sintering to remove the polymer on a top face of the electrode pattern to form a redistribution layer as the sintered electrode pattern.