The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2022

Filed:

Mar. 21, 2019
Applicant:

AU Optronics Corporation, Hsinchu, TW;

Inventors:

Po-Chao Chang, Taoyuan, TW;

Ruei-Pei Chen, Hsinchu County, TW;

Kuo-Yu Huang, Hsinchu County, TW;

Chao-Chien Chiu, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/14 (2006.01); H01L 27/12 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1225 (2013.01); G03F 7/075 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01);
Abstract

A photosensitive element and a manufacturing method thereof are provided. The manufacturing method of the photosensitive element includes successively depositing a second conductive layer, a photosensitive material layer, and a first top electrode material layer on a substrate; forming a first patterned photoresist layer on the first top electrode material layer; patterning the first top electrode material layer by using the first patterned photoresist layer as a mask to form a first top electrode; removing the first patterned photoresist layer; patterning the photosensitive material layer by using the first top electrode as a mask to form a photosensitive layer; forming an insulation layer having an opening on the first top electrode; and forming a second top electrode on the insulation layer, and the second top electrode is electrically connected to the first top electrode via the opening.


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