The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Oct. 26, 2017
Applicants:
Shin-etsu Polymer Co., Ltd., Tokyo, JP;
National University Corporation Saitama University, Saitama, JP;
Inventors:
Assignees:
SHIN-ETSU POLYMER CO., LTD., Tokyo, JP;
NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY, Saitama, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30604 (2013.01); H01L 21/02532 (2013.01); H01L 21/31111 (2013.01);
Abstract
An etching method for etching a substrate using a molten alkali, wherein, while an oxide coating is formed on the surface of the substrate PL to be etched in a high-temperature oxygen-containing environment, the surface to be etched is isotropically etched to remove the oxide coating using a molten alkali AL brought into a prescribed high-temperature range.