The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2022
Filed:
Feb. 21, 2018
Toray Industries, Inc., Tokyo, JP;
Toray Industries, Inc., Tokyo, JP;
Abstract
The present invention provides a laminated nonwoven fabric achieving both handling properties during manufacturing and use and adherence to a skin surface at a high level particularly when used for a face mask. The laminated nonwoven fabric includes a nonwoven fabric layer (A) and a nonwoven fabric layer (B). The nonwoven fabric layer (A) is formed from a fiber A having a single fiber diameter of 50 nm or more and 800 nm or less, and the nonwoven fabric layer (B) is formed from a fiber B having a single fiber diameter of 3 μm or more and 30 μm or less. The nonwoven fabric layer (B) includes 15 to 40% by mass of a fiber B1 to all of the fibers constituting the nonwoven fabric layer (B), the fiber having tensile strength of 2.0 cN/dtex or less as measured based on JIS L 1015: 2010 8.7.2. The nonwoven fabric layer (B) Includes a fiber B2 having tensile strength exceeding 2.0 cN/dtex as measured based on JIS L 1015: 2010 8.7.2. The nonwoven fabric layer (A) is disposed as an outermost layer of at least one surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile