The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2022

Filed:

Mar. 30, 2021
Applicant:

Singapore University of Technology and Design, Singapore, SG;

Inventors:

Fuming Chen, Singapore, SG;

Hui Ying Yang, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/28 (2006.01); B01J 20/20 (2006.01); B01J 20/32 (2006.01); B01J 20/34 (2006.01); B01J 20/30 (2006.01); G01N 27/06 (2006.01); C02F 101/10 (2006.01);
U.S. Cl.
CPC ...
B01J 20/20 (2013.01); B01J 20/205 (2013.01); B01J 20/3085 (2013.01); B01J 20/3204 (2013.01); B01J 20/3217 (2013.01); B01J 20/3248 (2013.01); B01J 20/345 (2013.01); B01J 20/3416 (2013.01); B01J 20/3475 (2013.01); C02F 1/283 (2013.01); C02F 1/285 (2013.01); C02F 1/288 (2013.01); G01N 27/06 (2013.01); C02F 2101/108 (2013.01); C02F 2303/16 (2013.01);
Abstract

The invention generally relates to a carbon-based boron removal medium with hydroxyl group and amine group, and in particular, to a method for forming the carbon-based boron removal medium. In various embodiments, nitrogen-doped ('N-doped') graphene oxide is synthesized by a simple two-step process: (1) oxidation of graphite to graphene oxide, and (2) nitrogen-doping ('N-doping') the graphene oxide to form the amine group. The resultant N-doped graphene oxide can efficiently remove boron from aqueous solutions. The invention also generally relates to a boron sensing medium and its use in conductometric measurement techniques to detect and measure the amount of boron present in aqueous solutions.


Find Patent Forward Citations

Loading…