The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2022

Filed:

Apr. 11, 2017
Applicant:

Conopco, Inc., Englewood Cliffs, NJ (US);

Inventors:

Ajit Manohar Agarkhed, Thane, IN;

Mohini Anand Bapat, Mumbai, IN;

Amitabha Majumdar, Bangalore, IN;

Prathyusha Mallemala, Bangalore, IN;

Mruthyunjaya Swamy Mathapathi, Bangalore, IN;

Nikita Tomar, Nagpur, IN;

Assignee:

CONOPCO, INC., Englewood Cliffs, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/41 (2006.01); A61K 8/67 (2006.01); A61Q 17/00 (2006.01); A61Q 19/10 (2006.01); A61K 31/455 (2006.01); A61K 31/14 (2006.01); A61K 9/00 (2006.01); A61P 31/02 (2006.01); A61K 45/06 (2006.01); A61K 9/08 (2006.01);
U.S. Cl.
CPC ...
A61K 8/416 (2013.01); A61K 8/675 (2013.01); A61K 9/0014 (2013.01); A61K 31/14 (2013.01); A61K 31/455 (2013.01); A61K 45/06 (2013.01); A61P 31/02 (2018.01); A61Q 17/005 (2013.01); A61Q 19/10 (2013.01); A61K 9/08 (2013.01); A61K 2300/00 (2013.01); A61K 2800/5922 (2013.01);
Abstract

The present invention relates to a topical composition. The present invention more particularly relates to a topical composition for antimicrobial benefit and a method of disinfecting a surface. According to the invention there is provided a topical composition comprising: a) 0.1 to 10% by weight of Niacinamide or its derivatives; b) 0.01% to 5% by weight of a first quaternary ammonium salt comprising Didecyl Dimethyl Ammonium Chloride; c) 0.01 to 5% by weight of a second quaternary ammonium salt; and d) a cosmetically acceptable base.


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