The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Jun. 24, 2019
Applicants:

Dh Technologies Development Pte. Ltd., Singapore, SG;

Eth Zürich, Zurich, CH;

Inventors:

Ronald F. Bonner, Newmarket, CA;

Stephen A. Tate, Barrie, CA;

Rudolf Aebersold, Zurich, CH;

Pedro Jose Navarro Alvarez, Zurich, CH;

Oliver Rinner, Zurich, CH;

Lukas Reiter, Wil, CH;

Ludovic Gillet, Zurich, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); G16C 20/90 (2019.01); H01J 49/42 (2006.01); G01N 30/72 (2006.01); G16C 20/20 (2019.01);
U.S. Cl.
CPC ...
H01J 49/0036 (2013.01); G01N 30/7233 (2013.01); G16C 20/90 (2019.02); H01J 49/004 (2013.01); H01J 49/0031 (2013.01); H01J 49/0045 (2013.01); H01J 49/42 (2013.01); G16C 20/20 (2019.02);
Abstract

Systems and methods are disclosed for analyzing a sample using overlapping precursor isolation windows. A mass analyzer of a tandem mass spectrometer is instructed to select and fragment at least two overlapping precursor isolation windows across a precursor ion mass range of a sample using a processor. The tandem mass spectrometer includes a mass analyzer that allows overlapping precursor isolation windows across the mass range of the sample.


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