The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Oct. 03, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Hariklia Deligianni, Alpine, NJ (US);

Bruce B. Doris, Slingerlands, NY (US);

Eugene J. O'Sullivan, Nyack, NY (US);

Naigang Wang, Ossining, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 17/00 (2006.01); H01F 41/04 (2006.01); H01F 17/04 (2006.01); H01F 41/02 (2006.01);
U.S. Cl.
CPC ...
H01F 17/0006 (2013.01); H01F 17/0013 (2013.01); H01F 17/04 (2013.01); H01F 41/0233 (2013.01); H01F 41/046 (2013.01); H01F 2017/0053 (2013.01); H01F 2017/0066 (2013.01); H01F 2017/046 (2013.01);
Abstract

Embodiments are directed to a method of forming a laminated magnetic inductor and resulting structures having anisotropic magnetic layers. A first magnetic stack is formed having one or more magnetic layers alternating with one or more insulating layers. A trench is formed in the first magnetic stack oriented such that an axis of the trench is perpendicular to a hard axis of the magnetic inductor. The trench is filled with a dielectric material.


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