The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2022
Filed:
Jul. 12, 2019
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Jeffrey D. Bude, Danville, CA (US);
David A. Alessi, Livermore, CA (US);
Maurice B. Aufderheide, Livermore, CA (US);
John E. Heebner, San Ramon, CA (US);
Andreas J. Kemp, Livermore, CA (US);
Otto L. Landen, Hayward, CA (US);
Andrew J. Mackinnon, Livermore, CA (US);
Raluca A. Negres, Pleasanton, CA (US);
Craig W. Siders, Livermore, CA (US);
Scott C. Wilks, Mountain View, CA (US);
Wade H. Williams, Manteca, CA (US);
Steven T. Yang, Danville, CA (US);
Thomas M. Spinka, Livermore, CA (US);
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC, Livermore, CA (US);
Abstract
A method for increasing the MeV hot electron yield and secondary radiation produced by short-pulse laser-target interactions with an appropriately high or low atomic number (Z) target. Secondary radiation, such as MeV x-rays, gamma-rays, protons, ions, neutrons, positrons and electromagnetic radiation in the microwave to sub-mm region, can be used, e.g., for the flash radiography of dense objects.