The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Jul. 12, 2019
Applicant:

Hewlett-packard Development Company, L.p., Spring, TX (US);

Inventors:

Manabu Ono, Yokohama, JP;

Takashi Nakazawa, Yokohama, JP;

Takeshi Kawamura, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 21/00 (2006.01); G03G 21/20 (2006.01); B01D 45/08 (2006.01); G03G 15/20 (2006.01);
U.S. Cl.
CPC ...
G03G 21/206 (2013.01); B01D 45/08 (2013.01); G03G 15/2017 (2013.01); G03G 15/2039 (2013.01); G03G 2221/1645 (2013.01);
Abstract

An image forming apparatus has an airborne particle reduction structure located in an airflow passage and including a first L-shaped baffle and a second L-shaped baffle. The first L-shaped baffle and the second L-shaped baffle each include an overhang extending from a bent portion to a first end and a wind receiver extending from the bent portion to a second end. Additionally, the first end of the first L-shaped baffle and the first end of the second L-shaped baffle are both oriented toward an upstream position of the airflow passage. The second end of the first L-shaped baffle is attached to a first airflow surface of the airflow passage, and the second end of the second L-shaped baffle is attached to a second airflow surface opposing the first airflow surface and located downstream from the first L-shaped baffle.


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