The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2022
Filed:
Sep. 08, 2020
Shanghai University, Shanghai, CN;
Tingyun Wang, Shanghai, CN;
Chuanlu Deng, Shanghai, CN;
Xueting Wang, Shanghai, CN;
Yi Huang, Shanghai, CN;
Xiaobei Zhang, Shanghai, CN;
SHANGHAI UNIVERSITY, Shanghai, CN;
Abstract
Disclosed is a method for fabricating a spherical concave mirror in an optical waveguide based on ultraviolet (UV) grayscale lithography. A key component is a specially designed mask pattern composed of a rectangle as well as a semicircle adjacent to the rectangle, where a rectangular area has no grayscale distribution, and UV light penetrating through different portions of the rectangular area has the same intensity; a semicircular area has the grayscale distribution, and the UV light penetrating through the semicircular area with the grayscale distribution is changed in intensity from the center of a circle in the radius direction according to a special function distribution law; an interlayer photoresist in the rectangular area is irradiated by the UV light penetrating through a mask plate and is developed to form an optical waveguide core.