The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Mar. 22, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Steven J. Holmes, Ossining, NY (US);

Deborah A. Neumayer, Danbury, CT (US);

Stephen Bedell, Wappingers Falls, NY (US);

Devendra K. Sadana, Pleasantville, NY (US);

Damon Farmer, White Plains, NY (US);

Nathan P. Marchack, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/56 (2006.01); C23C 16/50 (2006.01); C23C 16/26 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/26 (2013.01); C23C 16/50 (2013.01); C23C 16/56 (2013.01);
Abstract

A method of fabricating a glassy carbon film is described. The method includes forming a soluble layer on a substrate, forming a lift-off stack that includes a lift-off mask layer and a hard-mask layer, and forming a pattern in the lift-off stack to expose a portion of the soluble layer. The exposed portions of the soluble layer are removed to expose a portion of the substrate. A carbon material is over the exposed portion of the substrate. The soluble layer is dissolved in a solvent, and the lift-off stack is lifted-off.


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