The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2022
Filed:
Aug. 29, 2019
Applicant:
Enf Technology Co., Ltd., Yongin-si, KR;
Inventors:
Du Won Lee, Gyeongju-si, KR;
Sang Dae Lee, Hwaseong-si, KR;
Myung Ho Lee, Hwaseong-si, KR;
Myung Geun Song, Yongin-si, KR;
Assignee:
ENF TECHNOLOGY CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); G03F 7/42 (2006.01); H01L 21/027 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
C11D 7/5022 (2013.01); C11D 11/0047 (2013.01); G03F 7/423 (2013.01); H01L 21/0273 (2013.01);
Abstract
A thinner composition is capable of reducing the amount of photoresist used in a reducing resist consumption (RRC) coating process, an edge bead removed (EBR) process or the like, and removing unnecessary photoresist on an edge portion or a backside portion of the wafer. The thinner composition includes C-Calkyl C-Calkoxy propionate, propylene glycol C-Calkyl ether, and propylene glycol C-Calkyl ether acetate.