The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2022
Filed:
May. 30, 2019
Applicant:
L'oreal, Paris, FR;
Inventors:
Christopher Pang, New York, NY (US);
Tsang-Min Huang, Scotch Plains, NJ (US);
I-Fan Hsieh, Scotch Plains, NJ (US);
Assignee:
L'OREAL, Paris, FR;
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/14 (2006.01); A61K 8/34 (2006.01); A61K 8/39 (2006.01); A61K 8/49 (2006.01); A61Q 3/04 (2006.01);
U.S. Cl.
CPC ...
A61K 8/34 (2013.01); A61K 8/39 (2013.01); A61K 8/4973 (2013.01); A61Q 3/04 (2013.01);
Abstract
A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.