The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2022

Filed:

Feb. 14, 2018
Applicant:

Soko Kagaku Co., Ltd., Ishikawa, JP;

Inventors:

Akira Hirano, Aichi, JP;

Yosuke Nagasawa, Nara, JP;

Shigefusa Chichibu, Miyagi, JP;

Kazunobu Kojima, Miyagi, JP;

Assignee:

SOKO KAGAKU CO., LTD., Ishikawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 33/06 (2010.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/007 (2013.01); H01L 33/0075 (2013.01); H01L 33/06 (2013.01);
Abstract

To improve a wall plug efficiency in a nitride semiconductor light-emitting element for extracting ultraviolet light emitted from an active layer toward an n-type nitride semiconductor layer side to outside of the element. In the n-type AlGaN-based semiconductor layerconstituting the nitride semiconductor light-emitting element, a plurality of thin film-like Ga-rich layers that is a part of the n-type layerhaving a locally high Ga composition ratio exists spaced apart from each other in a vertical direction that is orthogonal to the upper surface of the n-type layer, an extending direction of at least a part of the plurality of Ga-rich layers on a first plane parallel to the vertical direction is inclined with respect to an intersection line between the upper surface of the n-type layer and the first plane, the plurality of Ga-rich layers exists in stripes on the second plane parallel to the upper surface of the n-type layerin an upper layer region having a thickness of 100 nm or less at lower side from the upper surface of the n-type layer, AlN molar fractions of the Ga-rich layersare greater than AlN molar fraction of a well layerin an active layerconstituting the light-emitting element


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