The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Apr. 25, 2019
Applicant:
Spts Technologies Limited, Newport, GB;
Inventor:
Mark Carruthers, Newport Gwent, GB;
Assignee:
SPTS TECHNOLOGIES LIMITED, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 27/12 (2006.01); H01L 27/32 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0217 (2013.01); H01L 21/02274 (2013.01); H01L 27/1262 (2013.01); H01L 27/3244 (2013.01); H01L 51/0097 (2013.01); H01L 51/56 (2013.01);
Abstract
A method of depositing a SiN film onto a flexible substrate includes providing the flexible substrate, and depositing the SiN film onto the flexible substrate in a plasma enhanced chemical vapour deposition (PECVD) process using SiH, Nand H, in which the temperature of the substrate is 200° C. or less and SiHis introduced into the PECVD process at a flow rate of greater than 100 sccm.