The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2022

Filed:

Aug. 29, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Kenji Kobayashi, Kyoto, JP;

Manabu Okutani, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); H01L 21/306 (2006.01); H01L 21/324 (2006.01); H01L 21/673 (2006.01); B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); B08B 3/022 (2013.01); C23C 16/458 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); H01L 21/02057 (2013.01); H01L 21/30604 (2013.01); H01L 21/324 (2013.01); H01L 21/6704 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01); H01L 21/67075 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/67303 (2013.01); H01L 21/68728 (2013.01); H01L 21/68764 (2013.01); H01L 21/68792 (2013.01);
Abstract

A substrate treatment method is provided, which includes: an organic solvent replacing step of supplying an organic solvent, whereby a liquid film of the organic solvent is formed on the substrate as covering the upper surface of the substrate to replace a rinse liquid with the organic solvent; a substrate temperature increasing step of allowing the temperature of the upper surface of the substrate to reach a first temperature level higher than the boiling point of the organic solvent after the formation of the organic solvent liquid film, whereby a vapor film of the organic solvent is formed below the entire organic solvent liquid film between the organic solvent liquid film and the substrate to levitate the organic solvent liquid film above the organic solvent vapor film; and an organic solvent removing step of removing the levitated organic solvent liquid film from above the upper surface of the substrate.


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