The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Aug. 22, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Takayuki Fujiwara, Joetsu, JP;
Ryo Mitsui, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/06 (2006.01); G03F 7/004 (2006.01); G03F 7/033 (2006.01); C07D 333/76 (2006.01); C07D 327/08 (2006.01); G03F 7/32 (2006.01); C07D 339/08 (2006.01); G03F 7/039 (2006.01); C07C 381/12 (2006.01); C07C 323/64 (2006.01);
U.S. Cl.
CPC ...
G03F 7/066 (2013.01); C07C 381/12 (2013.01); C07D 327/08 (2013.01); C07D 333/76 (2013.01); C07D 339/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0048 (2013.01); G03F 7/033 (2013.01); G03F 7/0397 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); C07C 323/64 (2013.01); C07C 2601/14 (2017.05); C07C 2603/74 (2017.05);
Abstract
A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.