The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Jul. 23, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method includes performing OPC on a first mask design having a plurality of patterns having line widths; measuring a number of each of the line widths within the first mask design on which the OPC was performed; obtaining a probability distribution of each of the line widths within the first mask design on which the OPC was performed; obtaining a distribution of each of the line widths by multiplying the number of each of the line widths by the probability distribution; obtaining a line width distribution of the first mask design by summing the distribution of each of the line widths; comparing a probability distribution within a first critical line width in the line width distribution with a first critical probability; and performing the OPC on the first mask design again if the probability distribution within the first critical line width is greater than the first critical probability.