The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2022

Filed:

Apr. 24, 2018
Applicants:

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Chengpeng Yao, Beijing, CN;

Lei Guo, Beijing, CN;

Ke Dai, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/13 (2006.01); G02F 1/1337 (2006.01); C09K 11/77 (2006.01); G01J 1/04 (2006.01); G01J 1/42 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1303 (2013.01); C09K 11/7773 (2013.01); G01J 1/0488 (2013.01); G01J 1/42 (2013.01); G02B 5/208 (2013.01); G02F 1/133788 (2013.01);
Abstract

The present application provides an apparatus for a photo-alignment process. The apparatus for a photo-alignment process includes a reflector, an up-conversion layer, and a polarizer optically coupled together. The reflector is configured to reflect an infrared light and provide a reflected infrared light to the up-conversion layer. The up-conversion layer is configured to convert the reflected infrared light to an ultraviolet light, and provide the ultraviolet light to the polarizer. The polarizer is configured to convert the ultraviolet light to a polarized ultraviolet light for the photo-alignment process.


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