The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Jun. 28, 2019
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Jaebum Lim, Suwon-si, KR;
Sunyoung Yang, Suwon-si, KR;
Sunghwan Kim, Suwon-si, KR;
Seunghyun Kim, Suwon-si, KR;
Yushin Park, Suwon-si, KR;
Assignee:
SAMSUNG SDI CO., LTD., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 65/02 (2006.01); H01L 21/027 (2006.01); H01L 21/3213 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
C08L 65/02 (2013.01); G03F 7/11 (2013.01); H01L 21/0276 (2013.01); H01L 21/32139 (2013.01); C08L 2203/20 (2013.01);
Abstract
A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.