The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2022

Filed:

Nov. 29, 2018
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Takuya Abe, Annaka, JP;

Masayuki Konishi, Tokyo, JP;

Chihiro Hayakawa, Tokyo, JP;

Masanao Kamei, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/89 (2006.01); A61Q 17/04 (2006.01); A61Q 1/00 (2006.01); C08G 77/14 (2006.01);
U.S. Cl.
CPC ...
C08G 77/14 (2013.01); A61K 8/89 (2013.01); A61Q 1/00 (2013.01); A61Q 17/04 (2013.01);
Abstract

This organic group-modified organosilicon resin is represented by the average composition formula (1).(RSiO)(RSiO)(RSiO)(RSiO)(RSiO)(SiO)  (1)[a, b, c, d, e and f are numbers that satisfy 0≤a≤400, 0<b≤200, 0≤c≤400, 0≤d≤320, 0≤e≤320, 0<f≤1,000, and 0.5≤(a+b+c)/f≤1.5.] Because this organic group-modified organosilicon resin can form films softer than those formed with trimethylene siloxysilicate, the cosmetic obtained by blending with said silicon resin feels good when used, has good cosmetic holding properties, spreads easily and has an excellent finish, easy removal, and superior scratch resistance.


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