The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Jan. 02, 2018
Applicant:
Korea Research Institute of Standards and Science, Daejeon, KR;
Inventors:
Assignee:
Korea Research Institute of Standards and Science, Daejeon, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/24 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32816 (2013.01); H01J 37/32165 (2013.01); H01J 37/32458 (2013.01); H05H 1/24 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H05H 1/4645 (2021.05);
Abstract
A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.
Lee, Hyo. (2021). Plasma generation apparatus (U.S. Patent No. 11211231). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11211231
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile